9th International Symposium on Laser Metrology LM2008
IMEKO TC14 –Technical Committee on the Measurement of Geometrical Quantities
30 June - 2 July 2008 , Singapore
Call for Papers & Announcement
With the growing interest in micro and nano-metrology, the scope of laser metrology has extended beyond the visible domain and over a wide spectrum that ranges from the extreme uv and x-ray to the near, far and infra-red regions. At the same time, traditional optical metrology has seen greater advances in system and methods targeting the growing spread of industrial requirements for super-smooth surfaces, hidden and sub-surface metrology, and inspection of aspheric and micro-lens array.
This symposium thus targets the broad area of Lasers and Optical Metrology with applications ranging from macro and micro to nano-engineering.These include specific applications in Aerospace, Automotive and Transport,Medical,Photonics, Manufacturing and Defense. The symposium hopes to attract researchers from such ersified fields of optical metrology to discuss new developments, developers to showcase new system and technologies for industrial applications as well as for end-users to discuss and compare existing systems and their future requirements. Student participation is especially welcomed and we anticipate that this platform offers an opportunity for students to discuss not only their research efforts but explore future job prospects. Topics include, but not limited to:
1. Dimensional Measurements Using Optical Techniques
2. Lasers and Laser Optics
3. Precision Optical Metrology
4. Active Vision/Metrology
5. Micro-Meso-Nano-Metrology
6. Resolution Enhancement Techniques
7. Interferometric and Diffractive Methods
8. Optical Measurement Standards and Calibration
9. Photomechanics
10. Photoelasticity & Birefringence Techniques
11. Holographic and Speckle Techniques
12. Moiré and Structured Illumination
13. Image Processing
14. Non-Destructive Testing Evaluation and Fault Detection
15. Shape Measurement/Reverse Engineering
16. Thin Film Metrology
17. EUV, X-Ray Metrology
18. AFM, SEM Systems
19. Ultrafast Laser Metrology
20. Spectroscopy and Spectral Metrology
IMPORTANT
Submissions imply the intent of at least one author to register, attend the conference, present the paper (either orally or in poster format), and submit a full-length manuscript for publication in the conference Proceedings. Proceedings will be published by SPIE. Selected authors will be invited to send papers for special issue of Optics and Lasers in Engineering
Abstract Due Date: 31 January 2008
Manuscript Due Date: 15 March 2008
Web Page: http://www.lm2008.org
